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Tetramethylsilane

Tetramethylsilane
Flat structural formula
Ball-and-stick model
Space-filling model
Names
Preferred IUPAC name
Tetramethylsilane
Identifiers
3D model (Jmol)
Abbreviations TMS
1696908
ChEBI
ChemSpider
ECHA InfoCard 100.000.818
EC Number 200-899-1
MeSH Tetramethylsilane
PubChem CID
RTECS number VV5705400
UN number 2749
Properties
C4H12Si
Molar mass 88.23 g·mol−1
Appearance Colourless liquid
Density 0.648 g cm−3
Melting point −99 °C (−146 °F; 174 K)
Boiling point 26 to 28 °C (79 to 82 °F; 299 to 301 K)
Solubility organic solvents
Structure
Tetrahedral at carbon and silicon
0 D
Hazards
Extremely Flammable F+
R-phrases R12
S-phrases S16, S3/7, S33, S45
NFPA 704
Flammability code 4: Will rapidly or completely vaporize at normal atmospheric pressure and temperature, or is readily dispersed in air and will burn readily. Flash point below 23 °C (73 °F). E.g., propane Health code 3: Short exposure could cause serious temporary or residual injury. E.g., chlorine gas Reactivity code 1: Normally stable, but can become unstable at elevated temperatures and pressures. E.g., calcium Special hazards (white): no codeNFPA 704 four-colored diamond
Flash point −28 – −27 °C
Related compounds
Related silanes
 Silane

Silicon tetrabromide
Silicon tetrachloride
Silicon tetrafluoride
Silicon tetraiodide
Hexamethyldisilane
Related compounds
 Neopentane

Tetramethyltin
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
N  (what is YesYN ?)
Infobox references

Silicon tetrabromide
Silicon tetrachloride
Silicon tetrafluoride
Silicon tetraiodide
Hexamethyldisilane

Tetramethyltin

Tetramethylsilane (abbreviated as TMS) is the organosilicon compound with the formula Si(CH3)4. It is the simplest tetraorganosilane. Like all silanes, the TMS framework is tetrahedral. TMS is a building block in organometallic chemistry but also finds use in diverse niche applications.

TMS is a by-product of the production of methyl chlorosilanes, SiClx(CH3)4−x, via the direct process of reacting methyl chloride with silicon. The more useful products of this reaction are those for x = 1, 2, and 3.

TMS undergoes deprotonation upon treatment with butyllithium to give (H3C)3SiCH2Li. The latter, trimethylsilylmethyl lithium, is a relatively common alkylating agent.

In chemical vapor deposition, TMS is the precursor to silicon dioxide or silicon carbide, depending on the deposition conditions.

Tetramethylsilane is the accepted internal standard for calibrating chemical shift for 1H, 13C and 29Si NMR spectroscopy in organic solvents (where TMS is soluble). In water, where it is not soluble, sodium salts of DSS, 2,2-dimethyl-2-silapentane-5-sulfonate, are used instead. Because of its high volatility, TMS can easily be evaporated, which is convenient for recovery of samples analyzed by NMR spectroscopy.


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