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Silicon tetrafluoride

Silicon tetrafluoride
Silicon tetrafluoride
Silicon tetrafluoride
Names
IUPAC names
Tetrafluorosilane
Silicon tetrafluoride
Other names
Silicon fluoride
Fluoro acid air
Identifiers
3D model (Jmol)
ECHA InfoCard 100.029.104
PubChem CID
RTECS number VW2327000
UN number 1859
Properties
SiF4
Molar mass 104.0791 g/mol
Appearance colourless gas, fumes in moist air
Density 1.66 g/cm3, solid (−95 °C)
4.69 g/L (gas)
Melting point −90 °C (−130 °F; 183 K)
Boiling point −86 °C (−123 °F; 187 K)
decomposes
Structure
tetrahedral
0 D
Hazards
Main hazards toxic, corrosive
Safety data sheet ICSC 0576
NFPA 704
Flammability code 0: Will not burn. E.g., water Health code 3: Short exposure could cause serious temporary or residual injury. E.g., chlorine gas Reactivity code 2: Undergoes violent chemical change at elevated temperatures and pressures, reacts violently with water, or may form explosive mixtures with water. E.g., phosphorus Special hazard W: Reacts with water in an unusual or dangerous manner. E.g., cesium, sodiumNFPA 704 four-colored diamond
Lethal dose or concentration (LD, LC):
69,220 mg/m3 (rat, 4 hr)
Related compounds
Other anions
Silicon tetrachloride
Silicon tetrabromide
Silicon tetraiodide
Other cations
Carbon tetrafluoride
Germanium tetrafluoride
Tin tetrafluoride
Lead tetrafluoride
Related compounds
Hexafluorosilicic acid
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
YesY  (what is YesYN ?)
Infobox references

Silicon tetrafluoride or Tetrafluorosilane is the chemical compound with the formula SiF4. This tetrahedral molecule is notable for having a remarkably narrow liquid range (its boiling point is only 4 °C above its melting point). It was first synthesized by John Davy in 1812.

SiF
4
is a by-product of the production of phosphate fertilizers, resulting from the attack of HF (derived from fluorapatite protonolysis) on silicates, which are present as impurities in the phosphate rock. In the laboratory, the compound is prepared by heating BaSiF
6
above 300 °C, whereupon the solid releases volatile SiF
4
, leaving a residue of BaF
2
. The required BaSiF
6
is prepared by treating aqueous hexafluorosilicic acid with barium chloride. The corresponding GeF
4
is prepared analogously, except that the thermal "cracking" requires 700 °C.SiF
4
can also be created by placing silicon dioxide in hydrofluoric acid using the following equation:

This volatile compound finds limited use in microelectronics and organic synthesis.


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