Silicon fluoride
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| Names | |
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IUPAC names
Tetrafluorosilane
Silicon tetrafluoride |
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| Other names
Silicon fluoride
Fluoro acid air |
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| Identifiers | |
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3D model (Jmol)
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| ECHA InfoCard | 100.029.104 |
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PubChem CID
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| RTECS number | VW2327000 |
| UN number | 1859 |
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| Properties | |
| SiF4 | |
| Molar mass | 104.0791 g/mol |
| Appearance | colourless gas, fumes in moist air |
| Density | 1.66 g/cm3, solid (−95 °C) 4.69 g/L (gas) |
| Melting point | −90 °C (−130 °F; 183 K) |
| Boiling point | −86 °C (−123 °F; 187 K) |
| decomposes | |
| Structure | |
| tetrahedral | |
| 0 D | |
| Hazards | |
| Main hazards | toxic, corrosive |
| Safety data sheet | ICSC 0576 |
| NFPA 704 | |
| Lethal dose or concentration (LD, LC): | |
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LCLo (lowest published)
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69,220 mg/m3 (rat, 4 hr) |
| Related compounds | |
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Other anions
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Silicon tetrachloride Silicon tetrabromide Silicon tetraiodide |
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Other cations
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Carbon tetrafluoride Germanium tetrafluoride Tin tetrafluoride Lead tetrafluoride |
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Related compounds
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Hexafluorosilicic acid |
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Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
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 (what is   ?) |
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| Infobox references | |
Silicon tetrafluoride or Tetrafluorosilane is the chemical compound with the formula SiF4. This tetrahedral molecule is notable for having a remarkably narrow liquid range (its boiling point is only 4 °C above its melting point). It was first synthesized by John Davy in 1812.
SiF
4 is a by-product of the production of phosphate fertilizers, resulting from the attack of HF (derived from fluorapatite protonolysis) on silicates, which are present as impurities in the phosphate rock. In the laboratory, the compound is prepared by heating BaSiF
6 above 300 °C, whereupon the solid releases volatile SiF
4, leaving a residue of BaF
2. The required BaSiF
6 is prepared by treating aqueous hexafluorosilicic acid with barium chloride. The corresponding GeF
4 is prepared analogously, except that the thermal "cracking" requires 700 °C.SiF
4 can also be created by placing silicon dioxide in hydrofluoric acid using the following equation:
This volatile compound finds limited use in microelectronics and organic synthesis.
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Wikipedia