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| Names | |
|---|---|
| Preferred IUPAC name Gallium arsenide | |
| Identifiers | |
| 1303-00-0   | |
| 3D model (Jmol) | Interactive image | 
| ChemSpider | 14087   | 
| ECHA InfoCard | 100.013.741 | 
| EC Number | 215-114-8 | 
| MeSH | gallium+arsenide | 
| PubChem | 14770 | 
| RTECS number | LW8800000 | 
| UN number | 1557 | 
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| 
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| Properties | |
| GaAs | |
| Molar mass | 144.645 g/mol | 
| Appearance | Very dark red, vitreous crystals | 
| Odor | garlic-like when moistened | 
| Density | 5.3176 g/cm3 | 
| Melting point | 1,238 °C (2,260 °F; 1,511 K) | 
| insoluble | |
| Solubility | soluble in HCL insoluble in ethanol, methanol, acetone | 
| Band gap | 1.424 eV (at 300 K) | 
| Electron mobility | 8500 cm2/(V·s) (at 300 K) | 
| Thermal conductivity | 0.55 W/(cm·K) (at 300 K) | 
| 
Refractive index (nD) | 3.8 | 
| Structure | |
| Zinc blende | |
| T2d-F-43m | |
| 
a = 565.35 pm | |
| Tetrahedral | |
| Linear | |
| Hazards | |
| Safety data sheet | External MSDS | 
| GHS pictograms |     | 
| GHS signal word | DANGER | 
| H301, H331, H410 | |
| P261, P273, P301+310, P311, P501 | |
| 
EU classification (DSD) |  T  N | 
| R-phrases | R23/25, R50/53 | 
| S-phrases | (S1/2), S20/21, S28, S45, S60, S61 | 
| NFPA 704 | |
| Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa). | |
|  (what is   ?) | |
| Infobox references | |
Gallium arsenide (GaAs) is a compound of the elements gallium and arsenic. It is a III-V direct bandgap semiconductor with a zinc blende crystal structure.
Gallium arsenide is used in the manufacture of devices such as microwave frequency integrated circuits, monolithic microwave integrated circuits, infrared light-emitting diodes, laser diodes, solar cells and optical windows.
GaAs is often used as a substrate material for the epitaxial growth of other III-V semiconductors including indium gallium arsenide, aluminum gallium arsenide and others.
In the compound, gallium has a +3 oxidation state. Gallium arsenide single crystals can be prepared by three industrial processes:
Alternative methods for producing films of GaAs include:
Oxidation of GaAs occurs in air and degrades performance of the semiconductor. The surface can be passivated by depositing a cubic gallium(II) sulfide layer using a tert-butyl gallium sulfide compound such as (t
BuGaS)
7.